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| Semiconductor equipment |
Semiconductor equipmentTrack system for photoresist coating and developing
Spin Processors provide simple, efficient automatic cassette-to-cassette photoresist coat, develop, and bake applications for wafers up to 150mm. It is designed to process line widths of 0.8 Micron and higher. Systems can be configured for stand-alone process or process/bake with one, two, or three tracks per cabinet.
These systems are designed to provide fully automated processing at an affordable price. And each system is custom configured to each customers specific process and production requirements.
The systems are also designed to be easily maintained and not require extensive daily housekeeping. All major processing modules and components are easily accessible.
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